In an age in which the microchip is ubiquitous, the rewards for novel methods of microfabrification are great, and the vast possibilities of nanotechnology lie just a little ahead. Various methods of microlithography offer differing benefits, and even as older techniques such as optical lithography are being refined beyond what were once considered their upper limits of resolution, new techniques show great promise for going even further once they reach their technological maturity. Recent developments in optical lithography may allow it to break the 100-nm limit even without resorting to x-rays.
| Identifer | oai:union.ndltd.org:CLAREMONT/oai:scholarship.claremont.edu:pomona_theses-1015 |
| Date | 06 May 2004 |
| Creators | Carns, Regina C. |
| Publisher | Scholarship @ Claremont |
| Source Sets | Claremont Colleges |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | Pomona Senior Theses |
| Rights | © 2004 Regina C. Carns |
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