Atomic layer deposition of lanthanum based oxides for high-k gate dielectric applications /

Description

Thesis (M.S.)--University of Texas at Dallas, 2008. / Includes vita. Includes bibliographical references.

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Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/311867380
Date	January 2008
Creators	Hande, Aarabhi A.
Source Sets	OCLC
Language	English
Detected Language	English