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Evaluation of nitrogen incorporation effects in HfO₂ gate dielectric for improved MOSFET performance

Thesis (Ph. D.)--University of Texas at Austin, 2003. / Supervisor: Jack C. Lee. Vita. Includes bibliographical references. Available also from UMI Company.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/55217854
Date January 2003
CreatorsCho, Hag-ju, Lee, Jack Chung-Yeung,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

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