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Tantalum oxide thin films for microelectronic applications /

Thesis (M.S.)--Rochester Institute of Technology, 1995. / Typescript. Includes bibliographical references.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/35010818
Date January 1995
CreatorsJiang, Fang-Xing.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceOnline version of thesis

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