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On the plasma induced degradation of organosilicate glass (OSG) as an interlevel dielectric for sub 90 nm CMOS /

Thesis (M.S.)--Rochester Institute of Technology, 2008. / Typescript. Includes bibliographical references (leaves 79-80).

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/225865530
Date January 2008
CreatorsHuang, Amy.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceOnline version of thesis.

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