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Reliable gate dielectric for low-temperature thin-film transistors using plasma nitridation /

Thesis (M. Phil.)--University of Hong Kong, 2002. / Includes bibliographical references.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/51306675
Date January 2002
CreatorsOr, Chin-tung, David.
PublisherHong Kong : University of Hong Kong,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceView the Table of Contents & Abstract

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