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Selbst- und Fremddiffusion in amorphem Si 28 C 36 N 36 und Si 3 N 4

Stuttgart, Univ., Diss., 2000.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/314210351
Date January 2000
CreatorsMatics, Stefan.
Publisher[S.l. : s.n.],
Source SetsOCLC
LanguageGerman
Detected LanguageGerman
TypeOnline-Publikation.

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