The use of self-aligned Ti silicide in integrated Si technology /

Description

Diss. (sammanfattning) Stockholm : Tekn. högsk. / Härtill 8 uppsatser.

Links & Downloads

1. http://www.lib.kth.se/abs98/kapl0925.html
2. http://www.lib.kth.se/abs98/kapl0925.pdf

Tags

Doktorsavhandlingar.

Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/186063144
Date	January 1900
Creators	Kaplan, Wlodek,
Publisher	Stockholm : Tekniska högsk.,
Source Sets	OCLC
Language	English
Detected Language	Swedish
Source	Abstract Abstract