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Development of Silicon Nanowire Field Effect Transistors

An economically reliable technique for the synthesis of silicon nanowire was developed using silicon chloride as source material. The 30-40 micron long nanowires were found to have diameters ranging from 40 – 100 nm. An amorphous oxide shell covered the nanowires, post-growth. Raman spectroscopy confirmed the composition of the shell to be silicon-dioxide. Photoluminescence measurements of the as-grown nanowires showed green emission, attributed to the presence of the oxide shell. Etching of the oxide shell was found to decrease the intensity of green emission. n-type doping of the silicon nanowires was achieved using antimony as the dopant. The maximum dopant concentration was achieved by post-growth diffusion. Intrinsic nanowire parameters were determined by implementation of the as-grown and antimony doped silicon nanowires in field effect transistor configuration.

Identiferoai:union.ndltd.org:unt.edu/info:ark/67531/metadc103364
Date12 1900
CreatorsNukala, Prathyusha
ContributorsPhilipose, Usha, Neog, Arup, Guturu, Parthasarathy, Zhang, Hualiang
PublisherUniversity of North Texas
Source SetsUniversity of North Texas
LanguageEnglish
Detected LanguageEnglish
TypeThesis or Dissertation
FormatText
RightsPublic, Nukala, Prathyusha, Copyright, Copyright is held by the author, unless otherwise noted. All rights reserved.

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