the presented work demonstrates the fabrication process of the master for nano-imprint lithography (NIL) stamp for multi-mode waveguide (MM-WG) with μ-mirror using hybrid-lithography, which includes a 2-photon-polymerization direct laser writing process (2PP-DLW) for μ-mirror surface and UV-photo lithography for MM-WGs. For the definition of the mirror surface at either end of waveguides in the master stamp, the 2PP-DLW process was used. It offers a lower surface roughness (< 0.1 λ) with fewer processing steps, alignment accuracy of ± 1 μm, prints fine and sharp contours, and relatively faster scanning for a specific material, which makes it the foremost technology over the traditional micro-mirror processes such as the dicing process, moving mask lithography, laser ablation, wet etching, and dry etching. For the fabrication of the waveguide core with rectangular cross-sections in the master stamp, UV mask exposure with SU-8 was used. It is a mass-production and low-cost technique. It gives a smooth structure with 90-degree sidewalls compared to other processes like dry etching, wet etching, mosquito method, and E-beam writing. We demonstrated the design and process of a master pattern with a density range from 0.04 to 0.2 to maintain equal pressure over the stamp in the NIL step for an almost uniform residual thickness layer.:Abstract
Introduction
Design of Experiments
Experimental Results and Discussions
Conclusion
Identifer | oai:union.ndltd.org:DRESDEN/oai:qucosa:de:qucosa:93418 |
Date | 21 August 2024 |
Creators | Mistry, Akash, Nieweglowski, Krzysztof, Bock, Karlheinz |
Publisher | IEEE |
Source Sets | Hochschulschriftenserver (HSSS) der SLUB Dresden |
Language | English |
Detected Language | English |
Type | info:eu-repo/semantics/acceptedVersion, doc-type:conferenceObject, info:eu-repo/semantics/conferenceObject, doc-type:Text |
Rights | info:eu-repo/semantics/openAccess |
Relation | 979-8-3503-3484-5, 10.1109/ISSE57496.2023.10168370, 10.1109/ESTC55720.2022.9939534, 978-1-6654-8947-8 |
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