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Advanced technology for source drain resistance reduction in nanoscale FinFETs

Thesis (Ph. D.)--University of North Texas, May, 2008. / Title from title page display. Includes bibliographical references.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/263871783
Date January 2008
CreatorsSmith, Casey Eben. Reidy, Richard F.,
Publisher[Denton, Tex.] : University of North Texas,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
Sourceconnect to online resource.

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