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Study of AZO Multilayer Coatings on Glasses by Electron Beam Evaporation

In this study, the AZO thin films were deposited with various manufacturing conditions, such as working pressure of oxygen and substrate temperature, by e-beam evaporation. The microstructure of the AZO film was observed by SEM and AFM. Sheet resistance was measured using four-point probe method. Optical transmittance was measured in the visible range by UV spectrophotometer. Finally, AZO transparent film was used as a substitute for ITO to fabricate the radiation-resistant glasses.
The optimum parameters for depositing AZO films are glass substrates of 80¢J and working pressure of 1¡Ñ10-4 Torr. The film resistance is 9.2¡Ñ10-4 £[-cm with a film thickness of 60 nm. The refractive index was measured to be 2.05 at a wavelength of 510 nm. The optical transmittance of the prepared films was above 83 % in the visible range.
The manufacturing conditions for depositing AZO multilayer coatings are working pressure of 5.0¡Ñ10-5 Torr, ion gun working pressure of 6.0¡Ñ10-5 Torr, voltage of 6.2 V, oxygen gas flow rate of 36 sccm and glass substrates of 80¢J. The optical transmittance of the glass was above 94 % in the visible range.

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0820108-134323
Date20 August 2008
CreatorsShueh, En-Yi
ContributorsY.C. Chen, J.L. Huang, R. S. Guo, C.F. Yang, C. J. Huang
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0820108-134323
Rightsnot_available, Copyright information available at source archive

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