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New polymeric resists for electron beam lithography.

Multiple thin films which are conducting, insulating and semiconducting are important components of integrated circuit technology. Circuits are fabricated from these layers by patterning the films to form isolated circuit elements which are themselves interconnected by patterned films (1).

Identiferoai:union.ndltd.org:UMASS/oai:scholarworks.umass.edu:theses-2962
Date01 January 1982
CreatorsNarula, Ameeta
PublisherScholarWorks@UMass Amherst
Source SetsUniversity of Massachusetts, Amherst
Detected LanguageEnglish
Typetext
Formatapplication/pdf
SourceMasters Theses 1911 - February 2014

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