Distortion in conformable masks for evanescent near field optical lithography : a thesis submitted in partial fulfilment of the requirements for the degree of Master of Engineering in Electrical and Computer Engineering, University of Canterbury, Christchurch, New Zealand /

Description

Thesis (M.E.)--University of Canterbury, 2007. / Typescript (photocopy). "March 2007." Includes bibliographical references (p. 123-127). Also available via the World Wide Web.

Links & Downloads

1. http://library.canterbury.ac.nz/etd/adt-NZCU20070604.013906

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Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/174096662
Date	January 1900
Creators	Wright, A. J.
Source Sets	OCLC
Language	English
Detected Language	English