In thin film fabrication, growth of high quality thin films with reproducibile properties is one of the main challenges. In order to achieve this goal, the influnce of the deposition system control parameters on film properties must be studied. This can be a complex process since many parameters may need to be considered. In this thesis, the electron beam evaporation of thin aluminum oxide films was investigated. Films were deposited with and without oxygen supply in the chamber, and at various ebeam source settings. A Varialble Angle Spectroscopic Ellipsometry system was used to characterize the films. Refractive index, which depends on material density and stoichiometry, was used as the figure of merit. It was observed that refractive index increases with deposition rate. Refractive index also changes with oxygen pressure and upon exposure to air. Various models to explain this behaviour are proposed and discussed. / Materials Engineering
| Identifer | oai:union.ndltd.org:LACETR/oai:collectionscanada.gc.ca:AEU.10048/1673 |
| Date | 06 1900 |
| Creators | Muhammed, Harun |
| Contributors | Cadien, Kenneth (Chemical and Materials Engineering), Mitlin, David (Chemical and Materials Engineering), Barlage, Douglas (Electrical and Computer Engineering) |
| Source Sets | Library and Archives Canada ETDs Repository / Centre d'archives des thèses électroniques de Bibliothèque et Archives Canada |
| Language | en_US |
| Detected Language | English |
| Type | Thesis |
| Format | 1303452 bytes, application/pdf |
Page generated in 0.0017 seconds