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Study of defects associated with implantation of high dose vanadium and chromium into (100) single crystal silicon

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1. https://stars.library.ucf.edu/rtd/950

Identifer	oai:union.ndltd.org:ucf.edu/oai:stars.library.ucf.edu:rtd-1949
Date	01 July 2003
Creators	Neelakantan, Rajesh
Publisher	STARS
Source Sets	University of Central Florida
Language	English
Detected Language	English
Type	text
Source	Retrospective Theses and Dissertations