Return to search

Low temperature SF6/O2ECR plasma etching for polysilicon gates /

Thesis (M. Eng.)--Carleton University, 2002. / Includes bibliographical references (p. 60-63). Also available in electronic format on the Internet.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/290523513
Date January 1900
CreatorsHasan, Imad,
PublisherOttawa,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceProQuest Full Text

Page generated in 0.0027 seconds