In this study, the AZO thin films were deposited with various manufacturing conditions, such as working pressure of oxygen and substrate temperature, by e-beam evaporation. The microstructure of the AZO film was observed by SEM and AFM. Sheet resistance was measured using four-point probe method. Optical transmittance was measured in the visible range by UV spectrophotometer. Finally, AZO transparent film was used as a substitute for ITO to fabricate the radiation-resistant glasses.
The optimum parameters for depositing AZO films are glass substrates of 80¢J and working pressure of 1¡Ñ10-4 Torr. The film resistance is 9.2¡Ñ10-4 £[-cm with a film thickness of 60 nm. The refractive index was measured to be 2.05 at a wavelength of 510 nm. The optical transmittance of the prepared films was above 83 % in the visible range.
The manufacturing conditions for depositing AZO multilayer coatings are working pressure of 5.0¡Ñ10-5 Torr, ion gun working pressure of 6.0¡Ñ10-5 Torr, voltage of 6.2 V, oxygen gas flow rate of 36 sccm and glass substrates of 80¢J. The optical transmittance of the glass was above 94 % in the visible range.
| Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0820108-134323 |
| Date | 20 August 2008 |
| Creators | Shueh, En-Yi |
| Contributors | Y.C. Chen, J.L. Huang, R. S. Guo, C.F. Yang, C. J. Huang |
| Publisher | NSYSU |
| Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
| Language | Cholon |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0820108-134323 |
| Rights | not_available, Copyright information available at source archive |
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