Process development, material analysis, and electrical characterization of ultra thin hafnium silicate films for alternative gate dielectric application

Description

Thesis (Ph. D.)--University of Texas at Austin, 2002. / Vita. Includes bibliographical references. Available also from UMI Company.

Links & Downloads

1. http://www.lib.utexas.edu/etd/r/d/2002/gopalans022/gopalans022.pdf#page=4
2. http://wwwlib.umi.com/cr/utexas/fullcit?p3077648

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Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/52930755
Date	January 2002
Creators	Gopalan, Sundararaman.
Source Sets	OCLC
Language	English
Detected Language	English