Influence of source/drain residual implant lattice damage traps on silicon carbide metal semiconductor field effect transistor drain I-V characteristics

Description

Thesis (Ph.D.)--Mississippi State University. Department of Electrical and Computer Engineering. / Title from title screen. Includes bibliographical references.

Links & Downloads

1. http://sun.library.msstate.edu/ETD-db/theses/available/etd-09242007-081525

Tags

Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/502157891
Date	January 2007
Creators	Adjaye, John,
Publisher	Mississippi State : Mississippi State University,
Source Sets	OCLC
Language	English
Detected Language	English
Type	Electronic resources. Electronic theses/dissertations. Dissertations.