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Tailoring fluorene-based oligomers for micron and sub-micron sized photopatterning

Univ., Diss., 2009--Bayreuth.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/643177270
CreatorsScheler, Esther.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

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