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Application of ab-initio calculations to modeling of nanoscale diffusion and activation in silicon /

Thesis (Ph. D.)--University of Washington, 2004. / Vita. Includes bibliographical references (p. 121-127).

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/58803407
Date January 2004
CreatorsDiebel, Milan.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
TypeTheses
SourceConnect to this title online; UW restricted

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