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RESIDUAL STRESS IN GALLIUM NITRIDE FILMS GROWN BY METALORGANIC CHEMICAL VAPOR DEPOSITION

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Identiferoai:union.ndltd.org:OhioLink/oai:etd.ohiolink.edu:ohiou1171567935
Date January 2000
CreatorsChen, Ying
PublisherOhio University / OhioLINK
Source SetsOhiolink ETDs
LanguageEnglish
Detected LanguageGerman
Typetext
Sourcehttp://rave.ohiolink.edu/etdc/view?acc_num=ohiou1171567935
Rightsunrestricted, This thesis or dissertation is protected by copyright: all rights reserved. It may not be copied or redistributed beyond the terms of applicable copyright laws.

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