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III-nitride metal organic vapor phase epitaxy growth and characterization and use in gas sensing devices

Zugl.: Darmstadt, Techn. Univ., Diss., 2008

  1. http://d-nb.info/996578110/04
Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/458694947
Date January 2008
CreatorsCho, Eunjung
PublisherAachen Shaker
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

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