Return to search

Temperature control and characterization of silicon-germanium growth by rapid thermal chemical vapor deposition

Thesis (Ph. D.)--University of Texas at Austin, 2002. / Vita. Includes bibliographical references. Available also from UMI Company.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/52933913
Date January 2002
CreatorsHwang, Sung-Bo,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

Page generated in 0.0014 seconds