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The Fabrication and Uniformity Analysis of Low Temperature Ce3+¡GYAG Doped Glass

Using low-temperature (650¢J) Ce3+:YAG doped glass (LTCeYDG) phosphor layer instead of conventional Ce:YAG doped silicone phosphor layer applied to high-power phosphor-converted white-light-emitting diodes (PC-WLEDs) is demonstrated.The glass transition temperature (Tg) of silicone is 150¢J but glass is 750¢J,it shows the glass were employed in high power LED than silicon.
The uniformity of phosphor powder doped glass is an important item to discriminates between good and bad. Quantize the uniformity of glass phosphor by image processing software and Distribution Uniformity (Du). Calculate the uniformity of phosphor powder mix with glass powder which has different particle size and measurement optical properties of glass phosphor which has different uniformity. The Du of glass phosphor are 64.46%, 84.65%, 85.24% , 91.85% and the quantum efficiency are 18.49%, 28.31%, 29.73%, 28.56% ,respectively.
By using Ceramic tube and low temperature glass powder sintering glass phosphor is a new fabrication. Compare with last fabrication, new fabrication reduce 100¢Jfabrication temperature from 750¢J to 650¢J, 70% material savings and high luminous efficiency. The quantum efficiency and lumen per watt were improved about 7 percentage point from 22.3% to 29.1% and 4.2 lm/W from 36.4 lm/W to 40.68 lm/W. We used the XRD to analyze the glass phosphor of last fabrication and new fabrication and the results show that the higher thermal stress destroys the structure of YAG, lower fabrication temperature used to get higher luminous efficiency.

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0815112-184225
Date15 August 2012
CreatorsChen, Ji-Hung
ContributorsRay-Hua Horng, Wood-Hi Cheng, Jiang-Jen Lin, Jho-Hua Kuang, Chun-Chin Tsai
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0815112-184225
Rightsuser_define, Copyright information available at source archive

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