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Processing and reliability studies on hafnium oxide and hafnium silicate for the advanced gate dielectric application

Thesis (Ph. D.)--University of Texas at Austin, 2004. / Supervisor: Jack C. Lee. Vita. Includes bibliographical references.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/67134608
Date January 2004
CreatorsChoi, Rino, Lee, Jack Chung-Yeung,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

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