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Deposition and characterization of titanium dioxide and hafnium dioxide thin films for high dielectric applications /

Thesis (Ph. D.)--University of Washington, 2001. / Vita. Includes bibliographical references (leaves 152-158).

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/50297855
Date January 2001
CreatorsYoon, Meeyoung.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
TypeTheses
SourceConnect to this title online; UW restricted

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