Wang Xiaofeng = Hf基高K介电薄膜的微观结构和电子结构研究 / 王晓峰. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2006. / Includes bibliographical references (leaves 62-67). / Text in English; abstracts in English and Chinese. / Wang Xiaofeng = Hf ji gao K jie dian bo mo de wei guan jie gou he dian zi jie gou yan jiu / Wang Xiaofeng. / Table of Contents --- p.iv / List of Figures --- p.vii / List of Tables --- p.x / Chapter 1 --- Introduction --- p.1 / Chapter 2 --- Background --- p.3 / Chapter 2.1 --- Ideal high-k materials --- p.3 / Chapter 2.1.1 --- Current problems with Si02 and possible solutions --- p.3 / Chapter 2.1.2 --- Requirements on the high-k gate dielectric materials --- p.6 / Chapter 2.2 --- Recent results on high-k gate dielectrics --- p.8 / Chapter 2.2.1 --- A1203 --- p.8 / Chapter 2.2.2 --- Y203 and La203 --- p.9 / Chapter 2.2.3 --- Hf02 and Zr02 --- p.10 / Chapter 2.2.4 --- Pseudo-binary Alloys --- p.10 / Chapter 3 --- Experimental and Instrumentation --- p.13 / Chapter 3.1 --- Transmission electron microscopy (TEM) --- p.13 / Chapter 3.2 --- Transmission electron diffraction (TED) --- p.15 / Chapter 3.3 --- Electron energy loss spectroscopy (EELS) --- p.16 / Chapter 4 --- Data Analysis Methodology --- p.22 / Chapter 4.1 --- Diffraction analysis --- p.22 / Chapter 4.1.1 --- Ring ratio analysis for polycrystal diffraction pattern --- p.23 / Chapter 4.1.2 --- RDF analysis for amorphous materials --- p.24 / Chapter 4.2 --- Eliminating the plural scattering in EELS --- p.29 / Chapter 4.2.1 --- Removal of plural scattering from inner-shell edges --- p.30 / Chapter 4.2.2 --- Fourier-Ratio deconvolution --- p.30 / Chapter 4.2.3 --- "Demonstration using Co L2,3 core-loss spectrum" --- p.31 / Chapter 5 --- The Temperature Effect on the Microstructure of HfO2 Films --- p.37 / Chapter 5.1 --- Experimental --- p.38 / Chapter 5.2 --- Phase identification and crystallinity analysis of the Hf02 thin films --- p.38 / Chapter 5.2.1 --- Phase and crystallinity analysis from TEDs --- p.38 / Chapter 5.2.2 --- The phase and crystallinity evolution with the growth temperature --- p.39 / Chapter 5.3 --- The local symmetry of Hf atom in the films --- p.40 / Chapter 6 --- Effect of A1 Addition on the Microstructure and Electronic Structure of HfO2 Films --- p.43 / Chapter 6.1 --- Experimental --- p.44 / Chapter 6.2 --- RDF analysis of HfAlO films --- p.45 / Chapter 6.3 --- The local symmetry of Hf atom in the HfAlO films --- p.46 / Chapter 6.4 --- Loss functions of HfAlO films --- p.48 / Chapter 7 --- Comparison of A1 and Y Addition on the Microstructure of Hf02 Films --- p.56 / Chapter 7.1 --- Experimental --- p.57 / Chapter 7.2 --- Phase identification and crystallinity analysis of the alloy thin films --- p.57 / Chapter 7.2.1 --- Phase and crystallinity analysis from TEDs --- p.57 / Chapter 7.2.2 --- The phase and crystallinity evolution with the Y and A1 incorporation --- p.58 / Chapter 7.3 --- The local symmetry of Hf atom in the alloy thin films --- p.59 / Chapter 8 --- Conclusion --- p.61 / Bibliography --- p.62
| Identifer | oai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_325719 |
| Date | January 2006 |
| Contributors | Wang, Xiaofeng, Chinese University of Hong Kong Graduate School. Division of Physics. |
| Source Sets | The Chinese University of Hong Kong |
| Language | English, Chinese |
| Detected Language | English |
| Type | Text, bibliography |
| Format | print, x, 67 leaves : ill. ; 30 cm. |
| Rights | Use of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/) |
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