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Depozice Ga a GaN nanostruktur na křemíkový a grafenový substrát / The deposition of Ga and GaN nanostructures on silicon and graphene substrate

The thesis is focused on the study of properties of GaN nanocrystals and Ga structures on the surface of silicon and graphene substrate. In the theoretical part of this thesis, the basic properties of Ga/GaN and graphene are described, as well as their applications or connection of both structures together in different devices. The ability of metal nanoparticles to enhance not only photoluminescence, due to the interaction of the material with surface plasmons, is also shown in several examples. The experimental part of the work first deals with the production and characterization of graphene sheets prepared by Chemical Vapor Deposition. Ga/GaN growth on both types of substrates was performed in a UHV chamber using an effusion cell for Ga deposition and an atomic ion source for nitridation. Prepared structures were characterized using various methods (XPS, SEM, AFM, Raman spectroscopy or photoluminescence). In the last step, GaN nanocrystals were coated with Ga islands to study the photoluminescence enhancement.

Identiferoai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:443760
Date January 2021
CreatorsNovák, Jakub
ContributorsJarý, Vítězslav, Mach, Jindřich
PublisherVysoké učení technické v Brně. Fakulta strojního inženýrství
Source SetsCzech ETDs
LanguageCzech
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/masterThesis
Rightsinfo:eu-repo/semantics/restrictedAccess

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