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Modeling and simulation of arsenic activation and diffusion in silicon /

Thesis (Ph. D.)--University of Washington, 2002. / Vita. Includes bibliographical references (leaves 99-111).

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/50328254
Date January 2002
CreatorsFastenko, Pavel.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
TypeTheses
SourceConnect to this title online; UW restricted

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