III-V semiconductors are compounds made of elements from groups III and V of the periodic table. Most of these materials exhibit a direct bandgap, which makes them suitable for light emission and detection. Furthermore, ternary and quaternary III-V semiconductors offer some freedom in adjusting their material compositions, which also allows one to modify their bandgap energies, refractive indices, and other optical properties. This quality makes such materials suitable for the monolithic integration of laser sources with passive optical devices and detectors on a single chip. For example, such integration is used in indium phosphide (InP) technology for large-scale photonic integration in optical communication networks. Commercial integrated photonic circuits' functionality can be augmented by the implementation of nonlinear optical devices, enabling all-optical signal processing, frequency conversion, and on-chip sources of quantum light.
This doctoral thesis focuses on design, fabrication, and testing of passive optical components based on III-V semiconductors. We explored various fabrication approaches for III-V nonlinear photonic devices. Among the III-V semiconductor platforms used in nonlinear photonics, we focused on AlGaAs as the most studied nonlinear optical platform, and InP and its quaternary derivatives as the most commercially developed platform. The fabrication processes for III-V photonic devices usually require the deposition of silica and chromium layers, and then three etch steps to etch the chromium, silica, and, finally, the III-V layer. In the thesis, we demonstrate a process which allows one to eliminate the chromium deposition and the associated etch step, thereby reducing the process complexity. We implemented this newly developed hard-mask process for etching numerous AlGaAs and InP photonic devices. This work was not only an important contribution to the University of Ottawa's cleanroom facility. The shared recipe can be used to recreate etch recipes for silica using soft masks like ZEP520a, PMMA, etc., at other similar university and research facilities around the world. The silica mask created using this process was later used to fabricate InP/InGaAsP-based half-core-etched and nanowire waveguides, which were used to perform the first reliable measurement of the nonlinear refractive index coefficient n₂ of InGaAsP/InP waveguides.
We explored improved fabrication processes for AlGaAs waveguides, photonic crystals, and ring resonators. InP-based integrated optical devices are relatively difficult to fabricate because the etch byproducts are only volatile at elevated temperatures. Using a silica mask, we developed a very smooth etching process for InP waveguides with aspect ratios greater than 1:10. Suspended waveguide structures, where the guiding layer is surrounded by the air, are of great interest as they can exhibit large refractive index contrast for superior compactness and for achieving high intensity at low optical powers. We demonstrated fabrication process flows for creating suspended air-bridge structures in a 500-nm AlGaAs slab, which can be used in mid-IR sensing applications. The processes developed as part of this project cover a wide range of AlGaAs passive photonic devices such as waveguides, photonic crystals and ring resonators. Additionally, we demonstrated plasma etching selectivity improvements for AlGaAs etching using only a soft ZEP mask and were able to achieve a selectivity of 1:2.9. All these developments can be beneficial to other researchers working on III-V photonic devices.
We also completed the first theoretical study of third-harmonic generation in dispersion-engineered AlGaAs suspended photonic crystal waveguide. Most importantly, we introduced a reliable and efficient method for modelling higher-order modes in photonic crystal waveguides that is less computationally intensive and far more accurate compared to the 3D FDTD method. We also experimentally demonstrate guided modes lying above the light line in AlGaAs photonic crystal waveguides. In one of the addition projects, we experimentally demonstrate third-harmonic generation (THG) in Silicon Nitride waveguides.
In summary, this thesis presents details of the design and testing of different passive nonlinear III-V semiconductor photonic devices. In addition, this thesis presents the fabrication processes which can be used to reliably and repeatably fabricate photonic devices in these materials.
| Identifer | oai:union.ndltd.org:uottawa.ca/oai:ruor.uottawa.ca:10393/44054 |
| Date | 14 September 2022 |
| Creators | Vyas, Kaustubh |
| Contributors | Dolgaleva, Ksenia |
| Publisher | Université d'Ottawa / University of Ottawa |
| Source Sets | Université d’Ottawa |
| Language | English |
| Detected Language | English |
| Type | Thesis |
| Format | application/pdf |
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