The condition of the high-tech industry changes rapidly and the competition of the globe becomes sharp, we truly believe that the R&D professionals¡¦ innovation and technology will be the key factor of the business¡¦ expansion. To understand the R&D professionals¡¦ characteristic and requirement and to provide enough attraction to attract and retain them is the important topic in HRM.
This study focuses on the relationship with motivation, job satisfaction, family support, intention to stay and professional commitment. The survey adopted questionnaire as investigating method, and a total of 480 questionnaires are delivered to the high-tech R&D professionals. 304 of them are valid, so the response rate is 63.3%. The survey responses were analyzed by the Spss statistical software. The findings are summarized as follows:
1.The motivation factor that the R&D professionals respect most is enjoyment, and they care less about the compensation. Generally speaking they are satisfied with their job, intrinsic satisfaction especially. In the all factors of the motivation, challenge, enjoyment, and outward positive correlated with job satisfaction. All of them can improve the job satisfaction, but compensation negative with the job satisfaction.
2.A significant positive correlation was identified between job satisfaction and intention to stay.
3.A significant positive correlation was identified between job satisfaction and professional commitment.
4.Job satisfaction was found to have full mediating effect between motivation factor and intention to stay.
5.Job satisfaction was found to have partial mediating effect between motivation factor and professional commitment.
6.Family support was found to have significant moderating effect between job satisfaction and intention to stay. In the moderating effect, family support in higher-grades groups influenced intention to stay more significantly than lower-grades groups.
7.Family support was found to have no moderating effect between job satisfaction and professional commitment.
| Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0831105-093310 |
| Date | 31 August 2005 |
| Creators | Huang, Hui-chung |
| Contributors | Liang-chih Huang, Shyh-jer Chen, Ing-chuang Huang |
| Publisher | NSYSU |
| Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
| Language | Cholon |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0831105-093310 |
| Rights | campus_withheld, Copyright information available at source archive |
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