The purposes of this thesis are to prepare ZnO and tin-doped In2O3 (ITO) films at low temperature and study their microstructure and optoelectronic properties. Low-temperature growth of undoped ZnO films with high transparency and low electrical resistance was prepared by ion beam sputtering. After systematic testing, a sheet resistivity as low as 2.95 x 10-3 £[-cm was obtained at a substrate temperature of 150 oC, ion source voltage of 850 V, and ion beam current of 30 mA. The transmittance of the ZnO films was in the range of 85-90%. Hall measurements showed that a high mobility of 21.41 cm2/Vs was obtained for films less than 200 nm thick. The related microstructures and physical properties were measured and discussed.
ZnO nanofilm of (2-1-10) and (01-11) surfaces were prepared on NaCl (001) surface at 200 oC and 400 oC to produce nearly pure (2-1-10) and (01-11) textures respectively and the orientation relationships were determined and the interface discussed. By dissolving the NaCl substrate, the ZnO (2-1-10) and (01-11) surfaces several cm2 in area, which may have some useful applications, can be easily prepared. The photoluminescence spectrum from the (2-1-10) surface showed only a near-band-edge UV emission peak while the (01-11) surface showed a near band-edge UV emission and a broad green emission.
Low-temperature preparation of transparent conducting electrode is essential for flexible optoelectronic devices. ITO films of high transparency and low electrical resistance were prepared at room temperature with a radio-frequency ion beam sputtering system. Specimens with a low sheet resistivity of 10-4 £[-cm and a high visible-light transmittance of 85-90% were obtained. Hall measurement was used to measure the mobility and carrier concentrations and the effects on resistivity were discussed.
ITO films were deposited on glass substrates at 200 oC at various oxygen flow rates. At low oxygen flow rate the film surface has ITO whiskers with metallic In tips and a crystallographic relationship of (010)In//(110)ITO and (001)In//(001)ITO is present between them. The In tips act as the seeds for the growth of ITO whiskers by a vapor-liquid-solid growth mechanism.
As the oxygen flow rate increases, the crystallinity of the ITO film decreases till an amorphous phase is formed. The microstructure, resistivity and transmittance of the films were studied as a function of oxygen flow rate. Thin films of high transmittance (~90%) and low resistivity (6 x 10-4 Ω-cm) were prepared at an intermediate oxygen flow rates.
| Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0305110-002040 |
| Date | 05 March 2010 |
| Creators | Shen, Jung-hsiung |
| Contributors | Hsing-Lu Huang, Ker-Chang Hsieh, Pouyan Shen, Dershin Gan, Liuwen Chang |
| Publisher | NSYSU |
| Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
| Language | English |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0305110-002040 |
| Rights | not_available, Copyright information available at source archive |
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