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Mass and optical spectroscopy of CF₄ + O₂ plasmas and their application to the etching of Si, Ge and SiGe alloys

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1. https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.358064

Identifer	oai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:358064
Date	January 1993
Creators	Chatfield, Robert J.
Publisher	University of Bristol
Source Sets	Ethos UK
Detected Language	English
Type	Electronic Thesis or Dissertation
Source	http://hdl.handle.net/1983/821a17c4-1dad-442b-9179-1f521e571c0f