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Titanium dioxide thin films : understanding nanoscale oxide heteroepitaxy for silicon-based applications /

Thesis (Ph. D.)--University of Washington, 2005. / Vita. Includes bibliographical references (leaves 106-116).

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/65223338
Date January 2005
CreatorsSchmidt, Diedrich A.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
TypeTheses
SourceConnect to this title online; UW restricted

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