Return to search

Distortion in conformable masks for evanescent near field optical lithography : a thesis submitted in partial fulfilment of the requirements for the degree of Master of Engineering in Electrical and Computer Engineering, University of Canterbury, Christchurch, New Zealand /

Thesis (M.E.)--University of Canterbury, 2007. / Typescript (photocopy). "March 2007." Includes bibliographical references (p. 123-127). Also available via the World Wide Web.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/174096662
Date January 1900
CreatorsWright, A. J.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

Page generated in 0.002 seconds