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Effect of Nitrogen to Indium flux ratio on the InN surface morphologies grown on single crystal ZnO

In this thesis , we study the surface morphology of InN thin film grown on O-polar ZnO substrate by Macular Beam Epitaxy with varied N/In flow ratio. In addition, we also observe the difference to surface of InN between the substrate have been thermal annealed or not. We analysis the samples¡¦ surface morphology and lattice structures with many different ways, such as atomic force microscope, scanning electron microscope, reflection high energy electron diffraction,transmission electron microscope, X-ray diffraction analysis and transmission spectrum measurement. From the results of SEM and AFM,while the N/In ratio increased for the process of epitaxy, InN thin film¡¦s surface would become much smooth but accompany some pin holes on the surface which indicates that there exist the interaction between substrate and InN thin film. In the X-ray diffraction analysis, the greatest value of Full Width at Half Maximum (FWHM) we get is 94.44 (arcsec) to the (0002) surface of InN that confirm pretty high quality of InN thin film grown on O-polar ZnO substrate have been made. Furthermore, the band gap measured by transmission spectrum is wider for the N/In ratio increasing either which may be caused by the formation of InxNyOz.

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0703109-153201
Date03 July 2009
CreatorsKuo, Chih-Ming
ContributorsMing-Chi Chou, Ikai Lo, Jih-Chen Chiang
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0703109-153201
Rightsrestricted, Copyright information available at source archive

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