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Self-diffusion in silicon carbide.

Massachusetts Institute of Technology. Dept. of Metallurgy. Thesis. 1965. Sc.D. / Sc.D.

Identiferoai:union.ndltd.org:MIT/oai:dspace.mit.edu:1721.1/13369
Date January 1965
CreatorsGhoshtagore, Rathindra Nath
ContributorsRobert L. Coble., Massachusetts Institute of Technology. Department of Metallurgy, Massachusetts Institute of Technology. Department of Materials Science and Engineering
PublisherMassachusetts Institute of Technology
Source SetsM.I.T. Theses and Dissertation
LanguageEnglish
Detected LanguageEnglish
TypeThesis
Format122, [76] leaves, 9310373 bytes, 9310131 bytes, application/pdf, application/pdf, application/pdf
RightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission., http://dspace.mit.edu/handle/1721.1/7582

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