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Investigations of perspective materials for aggressively scaled gate stacks and contact structures of MOS devices

Brandenburgische Techn. University, Diss., 2002--Cottbus.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/175099955
CreatorsGoryachko, Andriy.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
TypeOnline-Publikation.

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