Three types of magnetic memory elements with emphasis
placed on low cost and batch fabrication are investigated.
The type I element consists of a wired hole in a strip of
Deltamax tape. The type II element uses a stack of magnetic
tape instead of the Deltamax. The type III element
consists of a pre-wired grid with magnetic material
deposited around the grid to simulate a wired core. The
results obtained from these investigations showed conclusively
that the type I element, referred to as apertured
Deltamax memory cell in this paper, operates
satisfactorily as a memory element. The fabrication
technology is based on etching small holes through a
thin Deltamax tape to form memory cells. The operation
of the uncompensated and compensated memory cell is
investigated. Oscillograms and graphs of the typical
characteristics response of the memory cell are presented,
and a qualitative description given.
The type II and type III elements are found
incapable of operating as a memory device because of the
magnetic properties of the available tape and magnetic
powder. Summaries of type II and III elements are given
in Appendix I and II respectively. / Graduation date: 1967 / Best scan available for figures. Original is a photocopy.
Identifer | oai:union.ndltd.org:ORGSU/oai:ir.library.oregonstate.edu:1957/28178 |
Date | 30 September 1966 |
Creators | Lee, Pedro |
Contributors | Stone, L. N. |
Source Sets | Oregon State University |
Language | en_US |
Detected Language | English |
Type | Thesis/Dissertation |
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