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The characteristics of planar magnetron and plasma systems used for deposition and surface treatment
No description available.
Links & Downloads
http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.344541
Tags
670
Additional Fields
Identifer
oai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:344541
Date
January 1983
Creators
Nyaiesh, A. R.
Publisher
University of Sussex
Source Sets
Ethos UK
Detected Language
English
Type
Electronic Thesis or Dissertation
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