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Screening experiment for a polysilicon gate etch chamber

Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1999. / Includes bibliographical references (leaf 53). / by Kim-Marie Levis. / S.M.

Identiferoai:union.ndltd.org:MIT/oai:dspace.mit.edu:1721.1/85325
Date January 1999
CreatorsLevis, Kim-Marie, 1976-
ContributorsGerald Benard and Klavs F. Jensen., Massachusetts Institute of Technology. Department of Materials Science and Engineering., Massachusetts Institute of Technology. Department of Materials Science and Engineering.
PublisherMassachusetts Institute of Technology
Source SetsM.I.T. Theses and Dissertation
LanguageEnglish
Detected LanguageEnglish
TypeThesis
Format57 leaves, application/pdf
RightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission., http://dspace.mit.edu/handle/1721.1/7582

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