Return to search

Feasibility study of spatial-phase-locked focused-ion-beam lithography

Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1995. / Includes bibliographical references (leaves 66-68). / by Anto Yasaka. / M.S.

Identiferoai:union.ndltd.org:MIT/oai:dspace.mit.edu:1721.1/32663
Date January 1995
CreatorsYasaka, Anto
ContributorsHenry I. Smith., Massachusetts Institute of Technology. Dept. of Materials Science and Engineering
PublisherMassachusetts Institute of Technology
Source SetsM.I.T. Theses and Dissertation
LanguageEnglish
Detected LanguageEnglish
TypeThesis
Format68 leaves, 3530072 bytes, 3532314 bytes, application/pdf, application/pdf, application/pdf
RightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission., http://dspace.mit.edu/handle/1721.1/7582

Page generated in 0.0017 seconds