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Wafer surface cleaning for silicon homoepitaxy with and without ECR hydrogen plasma exposure

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1994. / Includes bibliographical references (leaves 138-143). / by Hyoun-woo Kim. / Ph.D.

Identiferoai:union.ndltd.org:MIT/oai:dspace.mit.edu:1721.1/28125
Date January 1994
CreatorsKim, Hyoun-woo
ContributorsRafael Reif., Massachusetts Institute of Technology. Dept. of Materials Science and Engineering
PublisherMassachusetts Institute of Technology
Source SetsM.I.T. Theses and Dissertation
Languageen_US
Detected LanguageEnglish
TypeThesis
Format143 leaves, 8771647 bytes, 8790822 bytes, application/pdf, application/pdf, application/pdf
RightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission., http://dspace.mit.edu/handle/1721.1/7582

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