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The effect of oxygen partial pressure on the epitaxy of cerium oxide films deposited on nickel substrates

Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1996. / Includes bibliographical references (leaves 108-110). / by Todd S. Stefanik. / S.M.

Identiferoai:union.ndltd.org:MIT/oai:dspace.mit.edu:1721.1/47650
Date January 1996
CreatorsStefanik, Todd Stanley, 1973-
ContributorsMichael J. Cima., Massachusetts Institute of Technology. Dept. of Materials Science and Engineering., Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.
PublisherMassachusetts Institute of Technology
Source SetsM.I.T. Theses and Dissertation
LanguageEnglish
Detected LanguageEnglish
TypeThesis
Format110 leaves, application/pdf
RightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission., http://dspace.mit.edu/handle/1721.1/7582

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