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Copolymerization of divinylbenzene and 4-vinylpyridine using initiated chemical vapor deposition for surface modification and its applications

Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2013. / "June 2013." Cataloged from PDF version of thesis. / Includes bibliographical references (p. 29-30). / This research investigates the copolymerization of divinylbenzene and 4- vinylpyridine into organic thin films that exhibit conformal, stable, and uniform surface properties. Thin films were grown using initiated chemical vapor deposition, a variant of hot-wire deposition using a chemical initiator. Readily variable monomer flow into the active stage of the reactor allows for directly tunable copolymer composition. This tunability extends onto the control of material surface properties of a substrate that is coated with these organic thin films. The conditions of iCVD allow a variety of delicate substrates to be coated and for the full retention of pendant functional groups. This leads to their application to many industries including water desalination membranes, microfluidics, photolithography, sensors, among many others. The focus of this paper is on the facilitated control of surface modification using iCVD techniques and some of its future applications are also discussed. / by Ernesto Martinez. / S.B.

Identiferoai:union.ndltd.org:MIT/oai:dspace.mit.edu:1721.1/81141
Date January 2013
CreatorsMartinez, Ernesto, S.B. Massachusetts Institute of Technology
ContributorsKaren K. Gleason and Michael F. Rubner., Massachusetts Institute of Technology. Department of Materials Science and Engineering., Massachusetts Institute of Technology. Department of Materials Science and Engineering.
PublisherMassachusetts Institute of Technology
Source SetsM.I.T. Theses and Dissertation
LanguageEnglish
Detected LanguageEnglish
TypeThesis
Format30 p., application/pdf
RightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission., http://dspace.mit.edu/handle/1721.1/7582

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