Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2012. / Cataloged from PDF version of thesis. / Includes bibliographical references. / Block coopolymers(BCP) have become of interest in the pursuit novel methods of nanolithography. Their ability to self-assembly into periodic geometries with nanoscale feature sizes makes them attractive as etching masks and templating materials for microelectronics and nanodevices. BCP provide a scalable and low-cost method that is compatible with existing semiconductor fabrication technologies. Though various studies have looked at several combinations of block copolymers we focus on the use of solvent annealing as a method to tune the morphology of PS-b-PFS and PS-b- PFS-b-PS block copolymers. These polymers have shown promise as precursors to a variety of materials and in particular this combination of block copolymers is attractive because we have at our dispossible etching methods with a high selectivity between these two polymers. / by Juanml Carlos Ybarra. / S.B.
| Identifer | oai:union.ndltd.org:MIT/oai:dspace.mit.edu:1721.1/76125 |
| Date | January 2012 |
| Creators | Ybarra, Juan Carlos |
| Contributors | Caroline Ross., Massachusetts Institute of Technology. Dept. of Materials Science and Engineering., Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. |
| Publisher | Massachusetts Institute of Technology |
| Source Sets | M.I.T. Theses and Dissertation |
| Language | English |
| Detected Language | English |
| Type | Thesis |
| Format | 37 p., application/pdf |
| Rights | M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission., http://dspace.mit.edu/handle/1721.1/7582 |
Page generated in 0.1333 seconds