On the plasma induced degradation of organosilicate glass (OSG) as an interlevel dielectric for sub 90 nm CMOS /

Description

Thesis (M.S.)--Rochester Institute of Technology, 2008. / Typescript. Includes bibliographical references (leaves 79-80).

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1. http://hdl.handle.net/1850/5899

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Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/225865530
Date	January 2008
Creators	Huang, Amy.
Source Sets	OCLC
Language	English
Detected Language	English
Source	Online version of thesis.