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Ultra thin HfO₂ gate stack for sub-100nm ULSI CMOS technology

Thesis (Ph. D.)--University of Texas at Austin, 2002. / Vita. Includes bibliographical references.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/53167686
Date January 2002
CreatorsLee, Sungjoo.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

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